Huawei has patented ultraviolet light conversion technology to eliminate distortion due to interference when operating at extremely short wavelengths. This development allows it to use the 10nm process to print microchips on its own. And thus, not just to circumvent US sanctions, but to challenge the entire industry for the production of these devices.
Extreme ultraviolet (EUV) lithography is so complex that it took the Dutch company ASML 17 years and more than 6 billion euros of investment to create a commercial installation for its application. In it, drops of molten tin are irradiated twice with a laser - first to give them the shape of a pancake, and then to evaporate it. The result is a plasma microcloud that emits EUV light with the desired parameters. The process occurs at a frequency of 50,000 times per second.